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Jamie Boyd (born 1948) creates original fine art graphics. To create a COLOR graphic art, the artist draws a picture on a plate, and makes as many drawings on separate plates on separate each PLATES as number of colours he is using to use a separate colour ink on each plate, then all drawings from all plates accumulate on one sheet of archival paper. Jamie Boyd is the BOYD family most important living artist. Jamie Boyd work is held worldwide including Queen Victoria Museum in England, National Gallery of Australia, National Gallery of Victoria, The Tavistock Centre London. Growing up a creative family environment, Jamie began painting at the early age often painted en plein air with his father Arthur BOYD.

The Boyd family began in 1886 with the marriage of Emma Minnie à Beckett (1858-1936) and Arthur Merric Boyd Senior (1862-1940). Boyd family family produced many artists including painters, sculptors, architects, musicians and writers such as Theodore Penleigh, Martin à Beckett, William Merric, Helen à Beckett Read, William Merric, Lucy Gough, Arthur BOYD, David Boyd, Jamie Boyd, Guy Boyd, Mary Boyd (Arthur Boyd sister married John Perceval).

Lithography is a method of creation in which a stone or metal plate is used to transpose an image onto the final creation on archival paper. Lithography is known as planographic technique (surface-formation) based on the immiscibility (chemical repulsion of) immiscible liquids do not dissolve in each other like oil and water. Immiscible liquids are shaken together eventually separate into layers.

• In order to create a lithograph-INK, the artist makes an oil-crayon drawing on a the hard plate rock surface, a stone surface or a metal plate with an oil-based crayon-pencil. Limestone is usually the preferred surface for fine art.
  Typically the artist draws the desired image on a flat stone surface using a greasy litho crayon or a greasy black ink (touché).

• The essence of the Lithography technique is the fact that the oil crayon drawing on the stone, aluminum or zinc plate, repels water.

• When the oil crayon drawing is done and the plate then is covered with water, the water will only stay on the blank undrawn part of the plate.

• Then INK is rolled over the plate with the oily drawing. INK will only stick to the parts drawn with oily crayon drawing as they are compatible - and be repelled by the areas damp with water.

Applications of Lithograph Ink

Francisco Goya 1746-1828

Jean-Louis André Théodore Géricault 1791-1824

Eugène Delacroix 1798-1863

Winslow Homer 1836-1910

Honore Daumier 1808-1879

James Abbott McNeill Whistler 1834-1903

Édouard Manet 1832-83

Odilon Redon 1840-1916

Edgar Degas 1834-1917

Henri Fantin-Latour 1836-1904

Pierre Bonnard 1867-1947

Marc Chagall 1887-1985

Henri de Toulouse-Lautrec  1864-1901

The Lithography was used by some of the most important artists including Eugène Delacroix 1798-1863, Théodore Chassériau 1819-1856, Théodore Géricault 1791-1824, Francisco Goya 1746-1828.

Later the Lithography process had been further developed and it was now possible to give both colour and tone to a lithograph. It was discovered that every colour could be produced by overlapping blue, red, yellow and black.

Photolithography

Photolithography is a Lithography method using plates made photographically. A single iteration of photolithography combines several steps in sequence.

Photolithographs are drawn by hand onto transparent acetate sheets instead of hard plate. The image is then transferred to the plate via a photographic process. The plate is then inked up by hand in the same way as the other lithographs.

Color Photolithograph

I.E. To create a lithograph using five colours an artist will have to draw the image five times on five separate plates. Then one by one, all five plates are filled with colour-ink and multiplied on top of each other on the one sheet of archival paper. With multiple plates the inks will overlap in places (which are intentional) and thus create yet more colours and tones with that subtle and glaze - like translucence unique to lithography.

Photolithography, termed optical lithography or UV lithography, is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate.

It uses light to transfer a ‘drawing pattern’ from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. A series of chemical treatments then either engraves the exposure pattern into, or enables deposition of a new material in the desired pattern upon, the material underneath the photo resist. For example, in complex integrated circuits, a modern CMOS wafer will go through the photolithographic cycle up to 50 times.

The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. The name is compounded from them and photolithography is a method (originally based on the use of limestone printing plates) in which light plays an essential role.

In the 1820s, Nicephore Niepce invented a photographic process that used Bitumen of Judea, natural asphalt, as the first photoresist. A thin coating of the bitumen on a sheet of metal, glass or stone became less soluble where it was exposed to light, the unexposed parts could then be rinsed away with a suitable solvent, baring the material beneath, which was then chemically etched in an acid bath to produce a plate.

The light-sensitivity of bitumen was very poor and very long exposures were required, but despite the later introduction of more sensitive alternatives, its low cost and superb resistance to strong acids prolonged its commercial life into the early 20th century. In 1940, Oskar Süß created a positive photoresist by using diazonaphthoquinone, which worked in the opposite manner: the coating was initially insoluble and was rendered soluble where it was exposed to light. In 1954, Louis Plambeck Jr. developed the Dycryl polymeric letterpress plate, which made the platemaking process faster.

Photographic process

It is the chemical means by which photographic paper (or a strip or sheet of transparent plastic coated on one side with a gelatin emulsion containing microscopically small light-sensitive silver halide crystals) is treated after photographic exposure to produce a negative or positive image. Photographic processing transforms the latent image (an invisible image produced by the exposure to light of a photosensitive material) into a visible image, makes this permanent and renders it insensitive to light. All processes based upon the gelatin-silver process are similar, regardless of the film or paper's manufacturer. Exceptional variations include instant films such as Polaroid and thermally developed films. Kodachrome required Kodak's proprietary K-14 process. Kodachrome film production ceased in 2009, and K-14 processing is no longer available as of December 30, 2010. Ilfochrome materials use the dye destruction process.

Photolithographs Preparation

The wafer is initially heated to a temperature sufficient to drive off any moisture that may be present on the wafer surface, 150 °C for ten minutes is sufficient. Wafers that have been in storage must be chemically cleaned to remove contamination. A liquid or gaseous "adhesion promoter", such as Bis(trimethylsilyl)amine ("hexamethyldisilazane", HMDS) is applied to promote adhesion of the photoresist to the wafer. The surface layer of silicon dioxide on the wafer reacts with HMDS to form tri-methylated silicon-dioxide, a highly water repellent layer not unlike the layer of wax on a car's paint. This water repellent layer prevents the aqueous developer from penetrating between the photoresist layer and the wafer's surface, thus preventing so-called lifting of small photoresist structures in the (developing) pattern. In order to ensure the development of the image, it is best covered and placed over a hot plate and let it dry while stabilizing the temperature at 120 °C.

Photolithograph Photoresist application

The wafer is covered with photoresist by spin coating. A viscous, liquid solution of photoresist is dispensed onto the wafer, and the wafer is spun rapidly to produce a uniformly thick layer. The spin coating typically runs at 1200 to 4800 rpm for 30 to 60 seconds, and produces a layer between 0.5 and 2.5 micrometres thick. The spin coating process results in a uniform thin layer, usually with uniformity of within 5 to 10 nanometres. This uniformity can be explained by detailed fluid-mechanical modelling, which shows that the resist moves much faster at the top of the layer than at the bottom, where viscous forces bind the resist to the wafer surface. Thus, the top layer of resist is quickly ejected from the wafer's edge while the bottom layer still creeps slowly radially along the wafer. In this way, any 'bump' or 'ridge' of resist is removed, leaving a very flat layer. Final thickness is also determined by the evaporation of liquid solvents from the resist. For very small, dense features (< 125 or so nm), lower resist thicknesses (< 0.5 micrometres) are needed to overcome collapse effects at high aspect ratios; typical aspect ratios are < 4:1.

The photo resist-coated wafer is then prebaked to drive off excess photoresist solvent, typically at 90 to 100 °C for 30 to 60 seconds on a hotplate.

Photolithograph Exposure and Developing

After prebaking, the photoresist is exposed to a pattern of intense light. The exposure to light causes a chemical change that allows some of the photoresist to be removed by a special solution, called "developer" by analogy with photographic developer. Positive photoresist, the most common type, becomes soluble in the developer when exposed; with negative photoresist, unexposed regions are soluble in the developer.

A post-exposure bake (PEB) is performed before developing, typically to help reduce standing wave phenomena caused by the destructive and constructive interference patterns of the incident light. In deep ultraviolet lithography, chemically amplified resist (CAR) chemistry is used. This process is much more sensitive to PEB time, temperature, and delay, as most of the "exposure" reaction (creating acid, making the polymer soluble in the basic developer) actually occurs in the PEB.

The develop chemistry is delivered on a spinner, much like photoresist. Developers originally often contained sodium hydroxide (NaOH). However, sodium is considered an extremely undesirable contaminant in MOSFET fabrication because it degrades the insulating properties of gate oxides (specifically, sodium ions can migrate in and out of the gate, changing the threshold voltage of the transistor and making it harder or easier to turn the transistor on over time). Metal-ion-free developers such as tetramethylammonium hydroxide (TMAH) are now used.

The resulting wafer is then "hard-baked" if a non-chemically amplified resist was used, typically at 120-180 °C^{[citation needed]} for 20 to 30 minutes. The hard bake solidifies the remaining photoresist, to make a more durable protecting layer in future ion implantation, wet chemical etching, or plasma etching.

Photolithograph Photoresist removal

After a photoresist is no longer needed, it must be removed from the substrate. This usually requires a liquid "resist stripper", which chemically alters the resist so that it no longer adheres to the substrate. Alternatively, photoresist may be removed by a plasma containing oxygen, which oxidizes it. This process is called ashing, and resembles dry etching. Use of 1-Methyl-2-pyrrolidone (NMP) solvent for photoresist is another method used to remove an image. When the resist has been dissolved, the solvent can be removed by heating to 80 °C without leaving any residue.

Photolithograph Exposure ("lithography") systems

Exposure systems typically produce an image on the wafer using a photomask. The photomask blocks light in some areas and lets it pass in others. (Maskless lithography projects a precise beam directly onto the wafer without using a mask, but it is not widely used in commercial processes.) Exposure systems may be classified by the optics that transfer the image from the mask to the wafer.

Photolithograph History

The root words photo, litho, and graphic all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. The name is compounded from photolithography and a lithography method (originally based on the use of limestone printing plates) in which light plays an essential role.

In the 1820s, Nicephore Niepce invented a photographic process that used Bitumen of Judea, natural asphalt, as the first photoresist. A thin coating of the bitumen on a sheet of metal, glass or stone became less soluble where it was exposed to light; the unexposed parts could then be rinsed away with a suitable solvent, baring the material beneath, which was then chemically etched in an acid bath to produce a printing plate. The light-sensitivity of bitumen was very poor and very long exposures were required, but despite the later introduction of more sensitive alternatives, its low cost and superb resistance to strong acids prolonged its commercial life into the early 20th century.

In 1940, Oskar Süß created a positive photoresist by using diazonaphthoquinone, which worked in the opposite manner: the coating was initially insoluble and was rendered soluble where it was exposed to light.

In 1954, Louis Plambeck Jr. developed the Dycryl polymeric letterpress plate he filed for patents to protect his Photoimaging process inventions which made the platemaking process faster.

Photoimaging process Nov 25, 1980 - E. I. Du Pont de Nemours and Company

A method for producing a photopolymer image comprising (a) exposing, imagewise, a photosensitive element to actinic radiation, said element comprising a substrate coated with a photosensitive layer containing dispersed silver halide particles in operative association with a continuous film-forming phase of polymeric coupler, said coupler having (i) a number average molecular weight of about 2,000 to 100,000, (ii) a content of about 10 to 100 milliequivalents per 100 g of polymeric coupler of acidic methylene coupler groups and about 15 to 175 milliequivalents per 100 g of polymeric coupler of at least one of carboxylic, sulfonic and phosphonic acid groups, and (iii) the ability to couple with a monofunctional developing agent thus becoming water-insoluble; (b) developing (insolubilizing) the latent image; and (c) removing the undeveloped, soluble portion of the photosensitive element by washing with aqueous solvent.

Bundanon Trust

Creating of Self Portraits, T. Coats & M. Beazley

The Boyds, by an Australian biographer, literary critic and journalist Dr Brenda Niall AO (2002)

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Boyd Videos and Reviews 

VIDEO: Best of BOYD Exhibition in Galeria Aniela televised the ABC TV the Australian National TV 'Sunday Afternoon Arts'

The famous Boyd family artists could exhibit in any public gallery in London, New York or Paris but chosen Galeria Aniela fine art gallery to exhibit together 6 the 6 most celebrated artists of the distinguished Boyd family for the first time under one roof.

With personal input and warm support of Arthur Boyd, the Best of Boyd exhibition include Arthur Boyd, David Boyd, Guy Boyd, Jamie Boyd, Lenore Boyd and Tessa Perceval.

The Best of Boyd exhibition coup the front page of the Sydney Morning Herald (17 May 1997).

PHOTO: (2012) Hon. Bob Hawke, the 23 Prime Minister of Australia, Aniela, Anne Maria Nicholson, Helena Boyd, wife

PHOTO: (2012)Aniela, Hon. Bob Hawke, the 23 Prime Minister of Australia, Blanche D'Alpuget , Helena Boyd -  Hon. Bob Hawke & Jamie Boyd